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concentration boron process
Advances in Technologies for Boron Removal from Water: A
2022.8.27 The membrane processes for boron removal from water mainly include the reverse osmosis (RO) process, ion exchange membrane process (such as the electrodialysis (ED) process and Donnan dialysis (DD) process), forward osmosis (FO) process, and membrane distillation (MD) process.
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Boron recovery from salt lake brine, seawater, and
2023.4.1 The extraction of boron from the brine of boron concentration 5.43 g/L was carried out in a five-stage extraction process with 30% 2-ethyl-1,3-hexanediol at pH 2.0-3.0, organic/aqueous phase ratio 1:2 to achieve an extraction efficiency of 98.5%.
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Recent advances in boron removal in aqueous media. An
2024.1.16 It is important to highlight that the studies mentioned used different initial concentrations of boron, since the concentration in industrial effluents can vary from 30 to 7000 mg.L −1, as shown in Table 2. As seen in this review, pH is a notable factor influencing the boron adsorption mechanism.
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Recent advances in adsorption and coagulation for boron
2021.4.5 Chemical (oxo) precipitation adds chemical agents to remove boron from concentration solutions and produces insoluble substances. To select the treatment process properly, the initial concentration of boron and the composition of the wastewater are of great importance.
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Effective Removal of Boron from Aqueous Solutions by
2023.12.21 The development and investigation of efficient boron removal processes from aqueous solutions have become a crucial task due to the increasing boron concentration in surface and groundwater, as well as the need to treat seawater in desalination plants and wastewater from industries using boric acid as raw material
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Boron Removal from Reverse Osmosis Permeate Using an
2022.6.29 Abstract. Boron is present in the form of boric acid (B (OH) 3 or H 3 BO 3) in seawater, geothermal waters, and some industrial wastewaters but is toxic at elevated concentrations to both plants and humans.
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Sustainable treatment of boron industry wastewater with
2024.2.1 In this study, a sustainable treatment process was developed for wastewater containing high concentrations of boron. This study investigated the removal of boron from wastewater by Al (OH)3 sorption. The reuse of adsorbent (Al (OH)3) and the potential recovery of boric acid was the main goal of the study.
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The Effect of Initial pH and Retention Time on Boron
In this study, factors influencing boron removal via the continuous electrocoagulation process were. investigated at lab-scale. Different influent pH values (4, 5, 6, 7.45 and 9) and contact times (10, 25, 50 and. 100 min) were examined as variable parameters. Plate-type aluminium electrodes with 5 mm distance.
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Operating Cost and Treatment of Boron from Aqueous
2018.2.1 Residual boron concentrations of 3.49, 8.24, 1.34, 13.50, and 18.74 mg L−1 were obtained from initial boron concentrations of 10, 20, 30, 40, and 50 mg L−1, respectively. The decrease in boron removal can be explained by the fact that the generated iron ions are not sufficient. According to the other investigators,[3,43] EC can be used for ...
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(PDF) Implantation and Activation of High
2005.11.30 Implantation and Activ ation of High Concentrations. of Boron in Germanium. Y ong Seok Suh, Malcolm S. Carroll, Member, IEEE, Roland A. Levy, Gabriele Bisognin, D. De Salvador, M. Alper Sahiner ...
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[PDF] High-concentration boron doping of graphene
2015.5.5 B-doped graphene nanoplatelets prepared at 1000 °C show a maximum boron concentration of 6.04 ± 1.44 at %, which is the highest value among B-doped graphenes prepared using various methods. With well-mixed GO and g-B2O3 as the dopant, highly uniform doping is achieved for potentially gram-scale production.
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Investigation of the concentration characteristic of RCS
2023.8.1 During the boron replenishing phase, at the charging position, the system is charged with a high-concentration low-temperature boron solution (replenishing solution) from the boric acid storage tank at a constant volume flow rate (17.5 m 3 /h, 7000 ppm, 1–50 °C). A portion of the replenishing solution is heated by the heat exchanger and then ...
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Properties of boron-rich layer formed by boron diffusion in n
2014.8.1 The peak boron concentration in the non-etched sample was over 10 23 atoms/cm 3, which was much higher than any other reported boron concentration in BRL [8], [13]. This seems to imply that the peak concentration of BRL is process dependent. The depth of the junction was about 400 nm in non-etched sample. The junction depth
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Experimental investigation of forward osmosis process for boron
2020.12.1 1. Introduction. Boron is a vital nutrient for human health and plant growth, and is considered as one of the seven most important nutrients for plant growth and development [1].Boron deficiency and toxicity vary within limited degrees of concentration, whereas excessive boron in irrigation water could be toxic and harmful for plants [2].The
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Study on Eutectic Melting Behavior of Control Rod Materials
2021.10.19 The eutectic reaction between boron carbide (B 4 C) and stainless steel (SS) is one of the most important phenomena when considering the core disruptive accident (CDA) in a sodium-cooled fast reactor (SFR). Thus, in order to perform the safety assessment of SFR under postulated severe accidental condition reasonably, the kinetic
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Sustainable treatment of boron industry wastewater with
2023.12.1 The adsorption of boron on kaolinite in either medium showed similar dependence on pH and initial boron concentrations. Boron adsorption at higher pHs was noticeably higher in Ca(C104)2 medium as ...
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Research progress of 10B concentration and ...
2021.7.20 This article reviews the current methods of measuring the concentration distribution of boron-10 drugs, including the invasive estimation methods that have been used in clinical practice, the researching single photon emission tomography (SPECT) method, positron emission tomography (PET) method, nuclear magnetic resonance
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Understanding the setting and hardening process of
2020.8.1 This work investigates simplified systems comprising wollastonite and H 3 PO 4 solutions only, in order to clarify the influence of the H 3 PO 4 concentration, Ca/P and l/s ratios (this latter parameter being correlated to the two others) on the setting and hardening process. At constant H 3 PO 4 concentration, increasing the Ca/P ratio, and ...
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Study on Eutectic Melting Behavior of Control Rod Materials
2021.10.19 The eutectic reaction between boron carbide (B 4 C) and stainless steel (SS) is one of the most important phenomena when considering the core disruptive accident (CDA) in a sodium-cooled fast reactor (SFR). Thus, in order to perform the safety assessment of SFR under postulated severe accidental condition reasonably, the kinetic
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Effective Removal of Boron from Aqueous Solutions by
2023.12.21 The binding process of boron with NMDG-modified adsorbents is shown in Figure 2. Using the click coupling technique, ... the adsorption peaked at pH 10.0. At a low boron concentration of 5 mg/L, polyvinyl alcohol-functionalized polymers showed a higher adsorption capacity (45.5 mg/g). However, at a higher boron concentration (50 mg/L),
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Boron removal from seawater using a hybrid
2018.9.1 1. Introduction. Boron has a negative impact on humans and plants above a certain concentration. The World Health Organization (WHO) has fixed the limit of boron concentration in water for human consumption, first to 0.3, 0.5, and then to 2.4 mg/L in 2011 [1], however other legislations may be different.In irrigation water, it is usually admitted
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Boron segregation control in silicon crystal ingots grown in ...
2006.5.1 Boron-doped silicon single crystals of 207 mm diameter with various growing conditions are grown from a large amount of the melt in the cusp-magnetic Czochralski method, and the effects of growing parameters on dopant concentrations in the crystals are experimentally investigated.Equilibrium distribution coefficient of boron
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Removal of Boron from Waste Water by Electro-Coagulation Process
2013.1.1 The results show that the EC process for boron removal strongly depends on the current density, initial concentrations, and time. The process is examined under varying indices in order to ...
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Silicon Ion Implantation Process UniversityWafer, Inc.
2023.11.12 The doping concentration (Boron) might be 1 x 10^20/cm^-3. We are very interested in purchasing doped polysilicon wafers (4-inch wafers) with the following specifications. ... Doping concentration 20 wafers. Are you able to process the Boron ion implantation with the different doping concentrations into the polysilicon layer (i.e. a
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Development of a Real-Time Boron Concentration
2023.12.6 formed. The conditions for boron doping were a doping energy of 6.85 keV and a boron ion dose of 1.0 1710 ions/cm2 during implantation. To investigate the effects of the plasma doping energy on the boron concentration of the oxide layer, different plasma doping energy conditions during the p-type poly gate process were also used, which
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Controlling the hydrogen concentration in boron- and
2023.6.27 Fourier Transform-infrared spectroscopy at 5.0 K show that the hydrogen concentrations can be varied by altering the film thickness. The effect of a subsequent passivation process, i.e. deposition of a second hydrogen rich dielectric film at an elevated temperature, is also investigated.
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In situ boron-doped LPCVD polysilicon with low tensile
2003.12.1 A deposition process for in situ boron-doped LPCVD polysilicon with low tensile stress is described. The films are deposited with an amorphous microstructure and crystallised by post-deposition annealing. The final value of residual stress can be adjusted by the annealing temperature. The microstructure, resistivity, dopant concentration ...
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Boron removal from natural and wastewaters using
Volume 185, Issues 1–3, 1 November 2005, Pages 147-157. Boron removal from natural and wastewaters using combined sorption/membrane process. Presented at the Conference on Desalination and the Environment, Santa Margherita, Italy, 22–26 May 2005. European Desalination Society. LudmylaMelnyk, VladyslavGoncharuk, IrynaButnyk, EugeneTsapiuk.
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Experimental investigation of local boron concentration in a
The subcooled nucleate boiling experiment in the boron solution is conducted under forced convective conditions using a closed-loop system. The experimental facility comprises the experimental section, shielding pump, mixing device, heat exchanger, pressurizer, water tank, and preheater, as shown in Fig. 1.The boron-containing deionized water is provided
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Treatment of boron-containing optoelectronic wastewater by ...
2011.10.3 A greener and more cost-effective process was studied for boron removal from synthetic and optoelectronic wastewater by precipitation with lime (Ca(OH) 2) under moderate temperature (45–80 °C). The precipitates were characterized by SEM, XRD, and XPS, and confirmed that it was calcium borate (Ca 2 B 2 O 5.H 2 O). Pseudo-first order
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Boron concentration prediction from Compton camera image for boron ...
2022.8.1 Boron concentration prediction from Compton camera image for boron neutron capture therapy based on generative adversarial network. ... To simulate the CC imaging of the 0.478 MeV photons released in the BNCT process, the model based on the single layer CZT CC prototype from Kromek D-matrix has been built, the spatial
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Atomistic modeling of deactivation and reactivation ... - AIP
2003.11.12 While for B concentrations lower than 10 20 cm −3, B clusters are not formed unless a high Si interstitial concentration overlaps the B profile, our simulation results show that for higher B concentrations, B clusters can be formed even in the presence of only the equilibrium Si interstitial concentration. The existence of a residual ...
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Boron removal in seawater desalination by progressive
2024.1.25 Influence of the melting process on the boron removal rate. The relationship among ice melting percentage, boron concentration, and boron removal rate within the ice for different melting methods is shown in Fig. 6. Similar to the salinity removal results, boron melted out in large quantities with ice in the early stages and melted
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Operating Cost and Treatment of Boron from Aqueous
2018.4.20 Electrocoagulation process can be used for treatment of boron- polluted water and wastewaters containing boron at initial concentrations of more than 50 mg/L. View Show abstract
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Intense Blue Diamond with Very High Boron Concentration
2015.1.30 Normalized mid-IR absorption spectrum of the 1.18 ct Fancy Deep blue type IIb diamond, with saturated boron–related absorption and a 1290 cm –1 peak. This is the highest boron concentration ever reported in a natural diamond. Compared to other documented type IIb diamonds, the concentration is staggeringly high.
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Boron doping of ultrananocrystalline diamond films by
2018.8.13 A novel process for Boron doping of ultrananocrystalline diamond (UNCD) films, using thermal diffusion, is described. Hall measurements show an increase in carrier concentration from 1013 to 1020 cm~3. Ultraviolet Photoelectron Spectroscopy and x-ray Photoelectron Spectroscopy show a band gap of 4.4 eV, a work function of 5.1 eV and a
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Influence of boron concentration on growth ... - ScienceDirect
2011.2.1 For BDD electrodes preparation by DC-PCVD, high boron doping level in the film could improve the electrical conductivity of the electrode. However, high concentration of boron dopant in the preparation process usually causes glow discharge breakdown and finally destroys the active surface [22]. Thus, it is important to control the
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Characterization deep boron diffused p++ silicon layer
2012.2.2 In recent years the boron impurity-based dissolved wafer process has been repeatedly demonstrated as a powerful tool for forming single crystal Si microstructures. However, there is very little report on detailed characterization of the deep boron diffused silicon layer. This paper presents the optimization of deep boron diffused p++ silicon
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